MeiVac Precision 602 – Single Wafer System
Ferrotec’s MeiVac 602 series sputtering system was developed as a high reliability, high uptime, expandable system platform for the deposition of thin alumina gap layers.
- Production-proven 24/7 sputtering system
- Fully automated processing of up to 200mm ∅ substrates
- Film thickness uniformities typically <0.5% sigma/mean
- Helium Backside Gas Cooling keeps substrates typically <100°C
- RF Diode or Planar Magnetron sputter source options
- Available with multiple process chambers and load-locks