MeiVac 2480 RF Diode Batch System
Ferrotec’s MeiVac HEDA RF Diode sputtering system family was developed as a high throughput batch deposition system for thick alumina layers utilized in thin film heads for the magnetic storage industry.
Highlights
- Production-proven 24/7 sputtering system
- Semi-automated processing of up to six 150mm or four 200mm substrates per run
- 20 in. square target with RF Diode sputter source
- RF substrate bias option to enhance deposited film properties
- Film thickness uniformities typically <1% sigma/mean
- Helium Backside Gas Cooling keeps substrates typically <100°C
- Optimized for Hard Disk Drive Thin Film Head applications
- Production or development ready for MEMS, MRAM and other applications
- Programmable Logic Controller (PLC) and Graphical User Interface (GUI) delivers point and click functionality
- Configurable SECS/GEM option for communication with most fabs’ Manufacturing Execution Systems (MES)
- CE certified