MeiVac System Retrofits & Upgrades

MeiVac System Available Retrofits & Upgrades

System Upgrades

(Gas Management Option)

• O₂ doping of Ar plasma improves Alumina stoichiometry
• Equivalent film characteristics to the 2480
• Improves sidewall wet etch resistance
• Uniform Alkaline etch resistance of deposited Alumina
• Specifically, improves Alkaline etch resistance on trench sidewalls
• < 1.0% sigma/mean within wafer non-uniformity with optimized O2 process

 

Auto Phase Shifter/Monitor

• Active phase shifter
• Match box probes enable metering (digital readout)
• Fine resolution metering
• Allows return to specific phase shift
• Recipe driven
• Excellent resolution and repeatability
• Data logging capability

Wafer Size Upgrade

• 6 inch
• 8 inch

602 Upgrades

Robot Upgrade (Brooks Platform)

• Allows you to move away from obsolete robot configuration/components

Wafer Temperature Sensor

• Reduces wafer non-uniformity due to wafer over heating
• Valuable metric for process drift notification
• Reads temperature of each wafer upon exiting the process chamber
• Mounted to transfer chamber
• Data logging capability