Home | Thin Film Component Products | 2.0″ MAK Sputter Source Horizontal (rt. angle) mount
2.0″ MAK Sputter Source Horizontal (rt. angle) mount
Part Number: L200A01H
Description
Ferrotec Meivac Horizontal (rt. angle) mount sputter sources are noted for simplicity, ease of use, and resulting high reliability, the MAK sputter source has been designed to present the smallest profile possible and deliver higher deposition rates than any comparable sputter sources.
Specifications
Target Diameter |
2.0" (50.4mm)
|
Magnets |
Nd/FeB
|
Max Dc Power |
1000W
|
Max RF Power |
400W
|
Cathode Voltage (v) |
200-1000
|
Max Discharge Current |
3.0 A
|
Pressure Range (mtorr) |
0.5 – 600
|
Water Flow Rate |
0.8 gpm
|
Min CF Flange Size |
4.5" CF
|
Dimensions
Dimension |
Inches
|
A |
Ø 2.33
|
B |
3.91
|
B-2 |
0.71
|
C |
Ø 1.50
|
D |
12
|
D-2 |
4.5
|
E |
Ø 0.75
|
F |
2.3
|
Ordering
Ordering Information for Model L200A01H
If you have questions about pricing and availability, need more information about Ferrotec’s MeiVac Vari-Q throttle valve model L200A01H, or if you have other requirements, you can submit your request using the form or contact your Ferrotec representative directly.
Please Contact Me Regarding Ferrotec Model Number L200A01H
Use this form to submit your L200A01H inquiry directly to Ferrotec. If you have special requirements or need specific customizations, please include the details in your description.